J. W. Rogers, Jr.
Affiliate Professor of Chemical Engineering
Contact Information
| Associate Director Interfacial and Processing Sciences Environmental Molecular Sciences Laboratory PO Box 999, MSIN: K8-93 Richland, WA 99352 |
Phone: 509-376-1833 Fax: 509-376-5106 E-mail: jw.rogers@pnl.gov |
Education
B.S., University of Texas (Austin), 1975.
Ph.D., University of Texas (Austin), 1979.
Research Interests
Surface Chemistry and Engineering: Applications to Thin Film Deposition
Traditional techniques for depositing refractory thin films usually require high substrate temperatures in excess of 1000oC. Low-temperature (<500oC) deposition is required for a variety of technologically important applications where the substrate cannot survive a high-temperature processing step. Examples include such diverse technologies as 1) dielectric layers for quantum well devices, 2) lubricious oxides for tribological applications, and 3) conformal coatings for microelectronics packaging. To meet present and future needs, new deposition strategies are needed not only to deposit these films, but to build improved and tailored properties into the films. These strategies require a fundamental understanding of surface and gas-phase chemical and physical processes responsible for film growth.
This research program focuses on obtaining such an understanding of these processes involved in low-temperature deposition of refractory thin films by a variety of techniques, including chemical vapor deposition. A powerful battery of surface analytical and ambient pressure diagnostics are used to characterize adsorption, desorption, surface chemical interactions, nucleation, and growth phenomena associated with film deposition under reactive conditions. The experiments are conducted in state-of-the-art, coupled ultra-high vacuum surface spectrometer/high-pressure reactors, which include the following analytical techniques: X-ray photoelectron, Auger electron, ion scattering, and temperature-programmed desorption spectroscopies; FT-infrared and secondary-ion mass spectrometry; and low-energy electron diffraction. This information is used to develop new or improved deposition strategies for the growth of oxide, nitride, carbide, and composite thin films with a desired epitaxial relationship to the underlying substrate.
This program crosses the bounds of several science and engineering disciplines; it draws heavily on fundamentals from surface chemistry, surface physics, surface engineering, and materials science. It requires highly motivated students with a desire to understand the basic mechanisms and kinetics of surface chemical reactions and apply this information to technologically relevant problems.
Selected Recent Publications
D. C. Bertolet, Herng Liu, and J. W. Rogers, Jr., "Initial Stages of AlN Thin Film Growth on Alumina Using Trimethylamine Alane and Ammonia Precursors," J. Appl. Phys. 75, 5385-5390 (1994).
Herng Liu, D. C. Bertolet and J. W. Rogers, Jr., "The Surface Chemistry of Aluminum Nitride MOCVD on Alumina Using Trimethylaluminum and Ammonia as Precursors," Surface Science 320, 145-160 (1994).
Herng Liu, D. C. Bertolet, and J. W. Rogers, Jr., "Reactions of Trimethylaluminum and Ammonia on Alumina at 600 K: Surface Chemical Aspects of AlN Film Growth," Surface Science 340, 88-100 (1995).
A. Ludviksson, L. E. Rumaner, J. W. Rogers, Jr., and F. S. Ohuchi, "Vacuum Sublimation of GaSe: A Molecular Source for Deposition of GaSe," J. of Crystal Growth 151, 114-120 (1995).
Teresa A. Jurgens and J. W. Rogers, Jr., "The Reactions of Tetraethyoxysilane (TEOS) Vapor on Polycrystalline Titanium Dioxide," J. of Physical Chemistry 99, 731-743 (1995).
Recent M.S. Theses
Recent Ph.D. Dissertations
